Mask Industry Assessment: 2010

Greg Hughes; David Y. Chan

doi:10.1117/12.868465

24 September 2010 Mask Industry Assessment: 2010

Greg Hughes, David Y. Chan

Proceedings Volume 7823, Photomask Technology 2010; 782303 (2010) https://doi.org/10.1117/12.868465
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

A survey created supported by SEMATECH and administered by David Powell Consulting was sent to microelectronics industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the ninth in the current series of annual reports. With ongoing industry support, the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. It will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey was basically the same as the 2005 through 2009 surveys. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the critical mask industry. This profile combined with the responses to past surveys represents a comprehensive view of changes in the industry.

Citation Download Citation

Greg Hughes and David Y. Chan "Mask Industry Assessment: 2010", Proc. SPIE 7823, Photomask Technology 2010, 782303 (24 September 2010); https://doi.org/10.1117/12.868465

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