Efficient specification and characterization of surface roughness for extreme ultraviolet optics

Sven Schröder; Marcus Trost; Torsten Feigl; James E. Harvey; Angela Duparré

doi:10.1117/12.891280

8 April 2011 Efficient specification and characterization of surface roughness for extreme ultraviolet optics

Sven Schröder, Marcus Trost, Torsten Feigl, James E. Harvey, Angela Duparré

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79692C (2011) https://doi.org/10.1117/12.891280
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

EUV mirrors are cutting-edge optical surfaces. Meeting the roughness specifications over the entire range of relevant spatial frequencies is a challenging process. Recent developments that might help to increase the efficiency of EUV mirror production will be discussed including relaxed roughness specifications using the new Generalized Harvey Shack theory as well as a new approach for roughness measurements during and after manufacturing based on light scattering measurements and analysis. The method provides area covering images of the distribution of high-spatial frequency roughness (HSFR) over entire mirrors. Results will be presented for 660 mm diameter EUV collector mirror substrates.

Citation Download Citation

Sven Schröder, Marcus Trost, Torsten Feigl, James E. Harvey, and Angela Duparré "Efficient specification and characterization of surface roughness for extreme ultraviolet optics", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692C (8 April 2011); https://doi.org/10.1117/12.891280

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