Paper
18 February 2011 Mg/B4C EUV multilayer by introducing Co as barrier layer
Haochuan Li, Sika Zhou, Qiushi Huang, Moyan Tan, Li Jiang, Jingtao Zhu, Xiaoqiang Wang, Fengli Wang, Zhong Zhang, Zhanshan Wang, Lingyan Chen
Author Affiliations +
Proceedings Volume 7995, Seventh International Conference on Thin Film Physics and Applications; 79951E (2011) https://doi.org/10.1117/12.888272
Event: Seventh International Conference on Thin Film Physics and Applications, 2010, Shanghai, China
Abstract
Mg/B4C multilayer provides very high theoretical reflectivity in extreme ultraviolet range near 30.4nm wavelength, while the interface between Mg and B4C layer is very poor. In this paper, Co was introduced into the interface between Mg and B4C as a barrier layer. Mg/B4C and Co/Mg/Co/B4C multilayers were designed, fabricated, and measured for the wavelength of 30.4nm. The thickness of Co barrier layer was optimized. Grazing incidence x-ray reflectance measurements show that the structural quality of Co/Mg/Co/B4C multilayer is improved significantly after Co barrier layer inserting, and the optimum thickness of the barrier layer is 1.5nm.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Haochuan Li, Sika Zhou, Qiushi Huang, Moyan Tan, Li Jiang, Jingtao Zhu, Xiaoqiang Wang, Fengli Wang, Zhong Zhang, Zhanshan Wang, and Lingyan Chen "Mg/B4C EUV multilayer by introducing Co as barrier layer", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79951E (18 February 2011); https://doi.org/10.1117/12.888272
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Multilayers

Interfaces

Reflectivity

Extreme ultraviolet

Magnesium

X-rays

Sputter deposition

RELATED CONTENT


Back to Top