Paper
3 May 2011 Thickness control of a thin film after drying through thermal and evaporative management in drying process of a polymer solution coated on a flat substrate: application of the dynamical model of the drying process
Hiroyuki Kagami, Hiroshi Kubota
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Abstract
We have proposed and modified a model of drying process of polymer solution coated on a flat substrate for flat polymer film fabrication supposing resist coating process in semiconductor engineering process and so on. And we have clarified dependence of distribution of polymer molecules on a flat substrate on a various parameters based on analysis of many numerical simulations of the model. Then we applied the model to thickness control of a thin film after drying through thermal management. But minute thickness control of a thin film after drying was not enough and more minute thickness control of it was desired. Therefore, in this study, we add evaporative management for more minute thickness control of a thin film after drying. As a result, thickness control of a thin film after drying in drying process of a polymer solution coated on a flat substrate can be improved further through adding evaporative operations to thermal operations artificially and instantaneously depending on solute's distribution during drying.
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Hiroyuki Kagami and Hiroshi Kubota "Thickness control of a thin film after drying through thermal and evaporative management in drying process of a polymer solution coated on a flat substrate: application of the dynamical model of the drying process", Proc. SPIE 8068, Bioelectronics, Biomedical, and Bioinspired Systems V; and Nanotechnology V, 806813 (3 May 2011); https://doi.org/10.1117/12.886827
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Cited by 4 scholarly publications.
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KEYWORDS
Polymers

Polymer thin films

Thin films

Photoresist processing

Diffusion

Process modeling

Thermal modeling

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