Ronchigram analysis based on effective wavelength techniques and wavefront slope

F. S. Granados-Agustin; A. Garcia-Arellano; D. Aguirre-Aguirre; M. Campos-Garcia; A. Cornejo-Rodriguez

doi:10.1117/12.889551

23 May 2011 Ronchigram analysis based on effective wavelength techniques and wavefront slope

F. S. Granados-Agustin, A. Garcia-Arellano, D. Aguirre-Aguirre, M. Campos-Garcia, A. Cornejo-Rodriguez

Proceedings Volume 8083, Modeling Aspects in Optical Metrology III; 80830R (2011) https://doi.org/10.1117/12.889551
Event: SPIE Optical Metrology, 2011, Munich, Germany

Abstract

In this paper, some concepts and results associated with the interferometric concept of effective wavelength have been applied for the evaluation of optical surfaces. This testing technique measures the wavefront slope instead of the contour of the wavefront, like in the conventional interferometry. Therefore in this paper we present two methods of analysis of optical surfaces with the Ronchi test. First, we described a procedure to evaluate surfaces employing the effective wavelength in the Ronchi test [1]. Our results were computationally processed in order to reconstruct the wavefront of a particular mirror by means of the effective wavelength. A second proposal technique of analysis is based on the change of the traditional analysis of a ronchigram to a method by a proper scaling of the shearing interferogram, via the equivalent wavelength. The effective wavelength and equivalent wavelength are distinct concepts and are independent of the wavelengths used in the image registering process. Comparisons of the Zernike Polynomials for each wavefront with a reference wavefront show, the differences between both methods. Finally, we discuss some advantages and disadvantages of each of the proposed analysis and mention the principal factors to improve our results.

Citation Download Citation

F. S. Granados-Agustin, A. Garcia-Arellano, D. Aguirre-Aguirre, M. Campos-Garcia, and A. Cornejo-Rodriguez "Ronchigram analysis based on effective wavelength techniques and wavefront slope", Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 80830R (23 May 2011); https://doi.org/10.1117/12.889551

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