Paper
23 September 2011 Optical and electrical properties of GaN-based light emitting diodes grown on micro- and nano-scale patterned Si substrate
Ching-Hsueh Chiu, Chien-Chung Lin, Dongmei Deng, Hao-Chung Kuo, Kei-May Lau
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Abstract
We investigate the optical and electrical characteristics of the GaN-based light emitting diodes (LEDs) grown on Micro and Nano-scale Patterned silicon substrate (MPLEDs and NPLEDs). The transmission electron microscopy (TEM) images reveal the suppression of threading dislocation density in InGaN/GaN structure on nano-pattern substrate due to nanoscale epitaxial lateral overgrowth (NELOG). The plan-view and cross-section cathodoluminescence (CL) mappings show less defective and more homogeneous active quantum well region growth on nano-porous substrates. From temperature dependent photoluminescence (PL) and low temperature time-resolved photoluminescence (TRPL) measurement, NPLEDs has better carrier confinement and higher radiative recombination rate than MPLEDs. In terms of device performance, NPLEDs exhibits smaller electroluminescence (EL) peak wavelength blue shift, lower reverse leakage current and decreases efficiency droop compared with the MPLEDs. These results suggest the feasibility of using NPSi for the growth of high quality and power LEDs on Si substrates.
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Ching-Hsueh Chiu, Chien-Chung Lin, Dongmei Deng, Hao-Chung Kuo, and Kei-May Lau "Optical and electrical properties of GaN-based light emitting diodes grown on micro- and nano-scale patterned Si substrate", Proc. SPIE 8123, Eleventh International Conference on Solid State Lighting, 81231F (23 September 2011); https://doi.org/10.1117/12.893047
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KEYWORDS
Light emitting diodes

Silicon

Gallium nitride

Transmission electron microscopy

Quantum wells

Temperature metrology

Electroluminescence

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