Aberration correction for improving the performance of a DMHL system

Daniel R. McAdams; Daniel G. Cole

doi:10.1117/12.908984

15 February 2012 Aberration correction for improving the performance of a DMHL system

Daniel R. McAdams, Daniel G. Cole

Proceedings Volume 8253, MEMS Adaptive Optics VI; 82530O (2012) https://doi.org/10.1117/12.908984
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

Dynamic maskless holographic lithography (DMHL) is a new micro-manufacturing technique that has no moving parts. The laser light used for patterning is directed in all three dimensions with a hologram displayed on a liquid-crystal spatial light modulator (SLM). Optical aberrations, like spherical aberration due to refractive index mismatch between the photoresist and the immersion oil of the high-NA objective or astigmatism due to the deformations in the surface of the SLM, can degrade the performance of the system. Degraded performance includes a decrease in potential patterning volume and pattern fidelity and an increase in patterning time. This paper presents a way to correct for these aberrations using Zernike polynomials. The optimal Zernike coefficients are found by maximizing a sharpness metric. The effect of aberration correction on the DMHL process is quantified by measuring the patterning volume. DMHL manufactured features made with this aberration correction method show a marked improvement over features made without correction. It is even possible to correct for misaligned optics with this method.

Citation Download Citation

Daniel R. McAdams and Daniel G. Cole "Aberration correction for improving the performance of a DMHL system", Proc. SPIE 8253, MEMS Adaptive Optics VI, 82530O (15 February 2012); https://doi.org/10.1117/12.908984

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