Active-matrix nc-Si electron emitter array for massively parallel direct-write electron-beam system

N. Ikegami; T. Yoshida; A. Kojima; H. Ohyi; N. Koshida; M. Esashi

doi:10.1117/12.916250

21 March 2012 Active-matrix nc-Si electron emitter array for massively parallel direct-write electron-beam system

N. Ikegami, T. Yoshida, A. Kojima, H. Ohyi, N. Koshida, M. Esashi

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 832312 (2012) https://doi.org/10.1117/12.916250
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

This paper presents our designed and prototyped structure of electron emitter array integrated with an active-matrix driving LSI for high-speed massively parallel direct-write electron-beam (e-beam) system. In addition, the validation results of its performance as an electron source for massively parallel operation are described. Electron source used in this system is nanocrystalline Si (nc-Si) ballistic surface electron emitter where 1:1 projection of e-beam has been demonstrated to resolve patterns of 30 nm in width in our previous work. Electron emitting part of the device consists of arrayed dots of nc-Si emitter fabricated on SOI or Si substrate, and TSV (Through Silicon Via) plugs connected to the dots from back side of the substrate. Forming an aligned joint of the TSV plugs with driving pads on the active-matrix LSI constitutes the device. Electron emission is driven by the LSI operation, boosted up to appropriate level by the builtin voltage level shifter, in accordance with a bitmap image preliminarily stored in an embedded memory. Electron emission from a test structure of arrayed dot patterns of nc-Si emitter worked in practice, showing the possibility to switch on and off the beamlets by changing CMOS-compatible voltage.

Citation Download Citation

N. Ikegami, T. Yoshida, A. Kojima, H. Ohyi, N. Koshida, and M. Esashi "Active-matrix nc-Si electron emitter array for massively parallel direct-write electron-beam system", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832312 (21 March 2012); https://doi.org/10.1117/12.916250

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available