The root cause of ArF resist CD shrinkage induced by defect inspection

Tung-Chang Kuo

doi:10.1117/12.910067

3 April 2012 The root cause of ArF resist CD shrinkage induced by defect inspection

Tung-Chang Kuo

Proceedings Volume 8324, Metrology, Inspection, and Process Control for Microlithography XXVI; 83242C (2012) https://doi.org/10.1117/12.910067
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

For our first impression, defect inspector is considered to be a non-destructive equipment in an advanced Fab. When doing ADI inspection, only defect check is performed and photoresist keeps the same without any physical or chemical change. But is this true for now? I don't think so. Many phenomena or evidences tell us - in advanced processes, defect inspection does play more at the inspection step than what we expected before. Inspection can no longer be regarded as non-destructive. Some thing really happens when ADI inspection is executed. As a result, product suffers yield drop eventually. In the experiment below, different ArF resists among various processes are tested and investigated. Some ArF resists do react on UV light and contraction occurs. Basic studies and experiments based on our limited resources, equipment and time are carried out. We try to find out the mechanism and prove it.

Citation Download Citation

Tung-Chang Kuo "The root cause of ArF resist CD shrinkage induced by defect inspection", Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83242C (3 April 2012); https://doi.org/10.1117/12.910067

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