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17 April 2012 Front Matter: Volume 8328
Proceedings Volume 8328, Advanced Etch Technology for Nanopatterning; 832801 (2012) https://doi.org/10.1117/12.928433
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 8328, including the Title Page, Copyright information, Table of Contents, and the Conference Committee listing.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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"Front Matter: Volume 8328", Proc. SPIE 8328, Advanced Etch Technology for Nanopatterning, 832801 (17 April 2012); https://doi.org/10.1117/12.928433
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Cited by 2 scholarly publications.
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KEYWORDS
Plasma etching
Etching
Lithography
Plasma
CMOS technology
Nanostructures
Optical lithography
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