Paper
27 April 2012 Recent developments in the NPDD model
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Abstract
An understanding of the photochemical and photo-physical processes, which occur during photo-polymerization, is of extreme importance when attempting to improve a photopolymer material's performance for a given application. Recent work carried out on the modeling of photopolymers during- and post-exposure, has led to the development of a tool, which can be used to predict the behavior of a number of photopolymers subject to a range of physical conditions. In this paper, we explore the most recent developments made to the Non-local Photo-polymerization Driven Diffusion model, and illustrate some of the useful trends, which the model predicts and then analyze their implications on photopolymer improvement.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael R. Gleeson, Jinxin Guo, and John T. Sheridan "Recent developments in the NPDD model", Proc. SPIE 8429, Optical Modelling and Design II, 84291C (27 April 2012); https://doi.org/10.1117/12.922643
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Cited by 2 scholarly publications.
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KEYWORDS
Polymers

Diffusion

Polymerization

Oxygen

Molecules

Differential equations

Holography

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