Next generation nano-contamination monitoring

Steven Kochevar; Thomas Pietrykowski; Dan Rodier

doi:10.1117/12.928996

15 October 2012 Next generation nano-contamination monitoring

Steven Kochevar, Thomas Pietrykowski, Dan Rodier

Proceedings Volume 8492, Optical System Contamination: Effects, Measurements, and Control 2012; 84920H (2012) https://doi.org/10.1117/12.928996
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

Current particle counting techniques employ common technologies: lasers, detectors, and optics. The theory of light scattering and particles is well known, and is standard in most particle counters. However, the need to detect smaller particles (nanoparticles) challenges the technological limits of traditional light-scattering techniques. Counting nanoparticles in liquids offers unique problems because of the intensity of scattered light from the particles relative to the light scattered by the fluid and flow cell. Consequently, the particle may be lost in the background noise. New technologies employ sophisticated detection elements and high-powered lasers to provide three-dimensional particle signatures and real-time videos as the particle passes through the laser. Aerosol nanoparticle counting offers the challenge of light scatter in an open sample chamber. Simply, the nanoparticles are too small to be effectively illuminated by lasers, so a new technique employs dynamic mobility to classify specific particle sizes. This technique can provide particle counting—and accurate particle size classification—down to 5 nm. Employing traditional optical particle counting technology is not efficient for detecting nanoparticles, but new technologies can meet these challenges. When combined with other support equipment (e.g. WiFi, software, etc.), new technologies provide innovative techniques for monitoring nanoparticles and managing nano-contamination in clean environments.

Citation Download Citation

Steven Kochevar, Thomas Pietrykowski, and Dan Rodier "Next generation nano-contamination monitoring", Proc. SPIE 8492, Optical System Contamination: Effects, Measurements, and Control 2012, 84920H (15 October 2012); https://doi.org/10.1117/12.928996

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