Direct imprinting on chalcogenide glass and fabrication of infrared wire-grid polarizer

Itsunari Yamada; Naoto Yamashita; Toshihiko Einishi; Mitsunori Saito; Kouhei Fukumi; Junji Nishii

doi:10.1117/12.2016652

22 May 2013 Direct imprinting on chalcogenide glass and fabrication of infrared wire-grid polarizer

Itsunari Yamada, Naoto Yamashita, Toshihiko Einishi, Mitsunori Saito, Kouhei Fukumi, Junji Nishii

Proceedings Volume 8767, Integrated Photonics: Materials, Devices, and Applications II; 87670X (2013) https://doi.org/10.1117/12.2016652
Event: SPIE Microtechnologies, 2013, Grenoble, France

Abstract

Infrared wire-grid polarizers were fabricated consisting of a 500-nm pitch Al grating on a low toxic chalcogenide glass (Sb-Ge-Sn-S system) using the direct imprinting of subwavelength grating followed by a deposition of Al metal by thermal evaporation. To fabricate the subwavelength grating on a chalcogenide glass more easily, the sharp grating was formed on the mold surface. The fabricated polarizer with Al thickness of 130 nm exhibited a polarization function with a transverse magnetic transmittance greater than 60% in the 5–9-μm wavelength range, and an extinction ratio greater than 20 dB in the 4–11-μm wavelength range. The polarizer can be fabricated at lower costs and simpler fabrication processes compared to conventional infrared polarizers.

Citation Download Citation

Itsunari Yamada, Naoto Yamashita, Toshihiko Einishi, Mitsunori Saito, Kouhei Fukumi, and Junji Nishii "Direct imprinting on chalcogenide glass and fabrication of infrared wire-grid polarizer", Proc. SPIE 8767, Integrated Photonics: Materials, Devices, and Applications II, 87670X (22 May 2013); https://doi.org/10.1117/12.2016652

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KEYWORDS

Aluminum

Polarizers

Chalcogenide glass

Infrared radiation

Refractive index

Silicon carbide

Transmittance

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