PQ/PMMA and PVA/acrylamide photopolymer are fabricated in our Lab. We investigate the holographic characteristics of SiO2, Zinc methacrylate (ZnMA) doped and the methacrylate (MAA) linked PQ/PMMA photopolymer. By optimizing the doping content, the diffraction efficiency, photosensitivity and temperature stability have increased. Moreover, the holographic properties of PVA/acrylamide photopolymer have also been improved. The response time decreases by 55.7% at the optimized SiO2 concentration of 0.4wt%. The photosensitivity increases by 23.1% at the optimal preillumination energy of 72 μJ. Multilayer photopolymers with thicknesses over 500 μm were fabricated, exhibiting better Bragg selectivity.
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