Paper
15 October 2013 Model-based polishing of meter size optics
Jan-Claas Kupfer, Marcel Achtsnick, Elisabeth Becker
Author Affiliations +
Proceedings Volume 8884, Optifab 2013; 88841P (2013) https://doi.org/10.1117/12.2026930
Event: SPIE Optifab, 2013, Rochester, New York, United States
Abstract
In display or semiconductor manufacturing it is a constant drive towards the use of scale effects to reduce costs per unit. For equipment suppliers this leads to ever bigger optical components. To answer this need new cost-efficient technologies are required. In the process chain, the polishing step is one of the most important as it defines the optical surface. In this work the polishing step of a planar surface of a cylindrical component is investigated. A simulation for long scanning optics starting from Preston equation has been derived. By separating the optical surface into several zones, velocity variable polishing paths have been computed. Including pressure differences at the edges so called removal maps have been plotted. At the end, it has been verified that the model approach is able to influence polishing results of meter size optics by velocity controlled polishing.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan-Claas Kupfer, Marcel Achtsnick, and Elisabeth Becker "Model-based polishing of meter size optics", Proc. SPIE 8884, Optifab 2013, 88841P (15 October 2013); https://doi.org/10.1117/12.2026930
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KEYWORDS
Polishing

Surface finishing

Computer simulations

Model-based design

Optical scanning

Optical components

Optics manufacturing

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