Paper
17 April 2014 Repetitive operation of counter-facing plasma focus device: toward a practical light source for EUV lithography
Tatsuya Sodekoda, Hajime Kuwabara, Masashi Masuda, Shijia Liu, Kouki Kanou, Kenta Kawaguchi, Kazuhiko Horioka
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Abstract
In this paper, the latest advances in the field of extreme ultra violet (EUV) light sources for application in counter-facing plasma focus devices are presented. EUV emission, plasma and electrical properties under two pulses operation are reported. Using this new plasma focus system, the total amount of supply material and the energy cost of the plasma source could be reduced. The physical behavior during a two-pulse experiment with a high repetition rate (1 kHz) is explained. Continuous operation for future practical use in advanced lithography systems is also investigated.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tatsuya Sodekoda, Hajime Kuwabara, Masashi Masuda, Shijia Liu, Kouki Kanou, Kenta Kawaguchi, and Kazuhiko Horioka "Repetitive operation of counter-facing plasma focus device: toward a practical light source for EUV lithography", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904824 (17 April 2014); https://doi.org/10.1117/12.2046149
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Cited by 3 scholarly publications.
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KEYWORDS
Plasma

Electrodes

Extreme ultraviolet

Plasma systems

Light sources

Extreme ultraviolet lithography

Plasma generation

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