Extending lithography with advanced materials

Douglas J. Guerrero

doi:10.1117/12.2047302

27 March 2014 Extending lithography with advanced materials

Douglas J. Guerrero

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 905114 (2014) https://doi.org/10.1117/12.2047302
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Material evolution has been a key enabler of lithography nodes in the last 30 years. This paper explores the evolution of anti-reflective coatings and their transformation from materials that provide only reflection control to advanced multifunctional layers. It is expected that complementary processes that do not require a change in wavelength will continue to dominate the development of new devices and technology nodes. New device architecture, immersion lithography, negative-tone development, multiple patterning, and directed self-assembly have demonstrated the capabilities of extending lithography nodes beyond what anyone thought would be possible. New material advancements for future technology nodes are proposed.

Citation Download Citation

Douglas J. Guerrero "Extending lithography with advanced materials", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905114 (27 March 2014); https://doi.org/10.1117/12.2047302

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