The evolution of polymer surface topography in annealing

Pengfei Ma; Weiguo Liu; Huan Liu

doi:10.1117/12.2053127

16 December 2013 The evolution of polymer surface topography in annealing

Pengfei Ma, Weiguo Liu, Huan Liu

Proceedings Volume 9068, Eighth International Conference on Thin Film Physics and Applications; 90680T (2013) https://doi.org/10.1117/12.2053127
Event: Eighth International Conference on Thin Film Physics and Applications (TFPA13), 2013, Shanghai, China

Abstract

Ultrasmooth polymer films are of great importance in a large body of technical application. Photoresist technology plays a very important role in MEMS, and usually is to use optical coatings to transfer the smooth surface. In order to form different value of roughness is bright and clean surface or sacrifice layer microstructure, surface topography and its effect on the microstructure is crucial. Photoresist thin film EPG533 having different thicknesses of 270nm, 500nm, and 1 μm were deposited onto well-cleaned n-type silicon substrates by spin coating and annealed in the range from 100°C to 200°C.The effects of thermal annealing and thickness variation on the crystalline quality and surface morphology of the films were investigated by white light interferometry measurements. It was found that the film quality and morphology depend on the annealing temperature. The root-mean-square roughness and waviness on the surface change, as a result of increasing film thickness.

Citation Download Citation

Pengfei Ma, Weiguo Liu, and Huan Liu "The evolution of polymer surface topography in annealing", Proc. SPIE 9068, Eighth International Conference on Thin Film Physics and Applications, 90680T (16 December 2013); https://doi.org/10.1117/12.2053127

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