Kinoform lens focusing of high-energy x-rays (50 - 100 keV)

S. D. Shastri; K. Evans-Lutterodt; R. L. Sheffield; A. Stein; M. Metzler; P. Kenesei

doi:10.1117/12.2062635

17 September 2014 Kinoform lens focusing of high-energy x-rays (50 - 100 keV)

S. D. Shastri, K. Evans-Lutterodt, R. L. Sheffield, A. Stein, M. Metzler, P. Kenesei

Proceedings Volume 9207, Advances in X-Ray/EUV Optics and Components IX; 920704 (2014) https://doi.org/10.1117/12.2062635
Event: SPIE Optical Engineering + Applications, 2014, San Diego, California, United States

Abstract

High-energy x-rays from a synchrotron source are well suited for numerous applications, such as studies of materials structure and stress in bulk or extreme environments. Some of these methods require high spatial resolution. Planar kinoforms are shown to focus monochromatized undulator radiation in the 50–100 keV range down to 0.2–1.5 μm beam sizes at 0.25–2 m focal distances. These lenses were fabricated by reactive ion etching of silicon. At such high x-ray energies, these optics can offer substantial transmission and lens aperture.

Citation Download Citation

S. D. Shastri, K. Evans-Lutterodt, R. L. Sheffield, A. Stein, M. Metzler, and P. Kenesei "Kinoform lens focusing of high-energy x-rays (50 - 100 keV)", Proc. SPIE 9207, Advances in X-Ray/EUV Optics and Components IX, 920704 (17 September 2014); https://doi.org/10.1117/12.2062635

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