Paper
28 October 2016 Study on dynamic photographic properties of holographic gratings
Author Affiliations +
Proceedings Volume 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 96830Y (2016) https://doi.org/10.1117/12.2243281
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China
Abstract
Based on holographic recording technique, a study of the precise control of grating masks has been carried out. The incident light can be heavily absorbed even that photoresist thickness is under the submicron scale. The absorption rate of the photoresist will change greatly along the exposure processing, and it can serious influence the exposure dose of the photosensitive resin in the photoresist. In the old photographic models, it can’t get practical exposure dose distribution in the photoresist. In this paper, a new nonlinear photographic model is proposed, which is based on the absorption rate changing with the exposure dose. The new model can get more accurate exposure dose than that of the old models. The experiment of the developing speed changing with the exposure dose is carried out, and the developing speed variation curve is obtained. The experiment of the absorption rate changing with the exposure dose is also carried out, and the absorption rate variation curve is obtained. The experiment of fabricate holographic grating is also carried out. The dynamic analysis model of the grating mask structure agrees with the experimental results. The new nonlinear photographic model is of great significance to improve the control precision of holographic grating mask.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaoyang Li, Chaoming Li, Xinrong Chen, Jian Yu, Hang Zha, and Jianhong Wu "Study on dynamic photographic properties of holographic gratings", Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96830Y (28 October 2016); https://doi.org/10.1117/12.2243281
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KEYWORDS
Photoresist materials

Photography

Holography

Absorption

Beam splitters

Control systems

Optics manufacturing

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