Reversible nano-lithography for commercial approaches

Jae Hong Park; Hyun Ik Jang; Woo Choong Kim; Hae Su Yun; Jun Yong Park; Seok Woo Jeon; Hee Yeoun Kim; Chi Won Ahn

doi:10.1117/12.2205065

1 April 2016 Reversible nano-lithography for commercial approaches

Jae Hong Park, Hyun Ik Jang, Woo Choong Kim, Hae Su Yun, Jun Yong Park, Seok Woo Jeon, Hee Yeoun Kim, Chi Won Ahn

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 977723 (2016) https://doi.org/10.1117/12.2205065
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro- or nano-scale sensors and actuators.

Citation Download Citation

Jae Hong Park, Hyun Ik Jang, Woo Choong Kim, Hae Su Yun, Jun Yong Park, Seok Woo Jeon, Hee Yeoun Kim, and Chi Won Ahn "Reversible nano-lithography for commercial approaches", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 977723 (1 April 2016); https://doi.org/10.1117/12.2205065

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