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13 June 2022 Order-order transitions between thermal and direct immersion annealing in lamellar block copolymer films for accelerated self-assembly
Alamgir Karim, Kahitij Sharma, Ali Masud, Jack Douglas, Sushil Satija, John Ankner
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Proceedings Volume PC12054, Novel Patterning Technologies 2022; PC120540D (2022) https://doi.org/10.1117/12.2618055
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
Abstract
Long-period parallel lamellar morphologies for block copolymers (BCP) require long thermal annealing (TA) times or sensitive equipment for control. Direct immersion annealing (DIA) rapidly produces parallel microstructure but with smaller domains. We studied the transition between ordered states obtained by TA and DIA to understand the dynamics of the process, analyzed in terms of chain swelling, diffusion, and in-plane vs. out-of-plane interfacial evolution. We propose an alternate processing route for accelerated BCP assembly with large lamellar domain sizes. In addition, we report a transition morphology between the two lamellar states with characteristics of high surface roughness and surface area.
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Alamgir Karim, Kahitij Sharma, Ali Masud, Jack Douglas, Sushil Satija, and John Ankner "Order-order transitions between thermal and direct immersion annealing in lamellar block copolymer films for accelerated self-assembly", Proc. SPIE PC12054, Novel Patterning Technologies 2022, PC120540D (13 June 2022); https://doi.org/10.1117/12.2618055
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KEYWORDS
Annealing
Diffusion
Microwave radiation
Surface roughness
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