In situ process monitoring of two-photon lithography with optical diffraction tomography

Cheng Zheng; Peter So

doi:10.1117/12.2649490

17 March 2023 In situ process monitoring of two-photon lithography with optical diffraction tomography

Cheng Zheng, Peter So

Proceedings Volume PC12412, Laser 3D Manufacturing X; PC124120L (2023) https://doi.org/10.1117/12.2649490
Event: SPIE LASE, 2023, San Francisco, California, United States

Abstract

We present in situ monitoring of two-photon lithography with optical diffraction tomography (ODT) in an integrated home-built system. We show how two-photon lithographic system and intensity-based ODT can be organically integrated to provide reconstruction of 3D refractive index distribution of the printed structure at a diffraction-limited resolution. Due to ODT’s label-free nature, our method realizes in situ quality inspection of printed structure without specific sample preparation. In this way, our in situ observing solution can provide a timely feedback to the fabrication quality of two-photon lithography and potentially enables closed-loop optimizing and planning of printing parameters on-the-fly.

Conference Presentation

Citation Download Citation

Cheng Zheng and Peter So "In situ process monitoring of two-photon lithography with optical diffraction tomography", Proc. SPIE PC12412, Laser 3D Manufacturing X, PC124120L (17 March 2023); https://doi.org/10.1117/12.2649490

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