Contributing to sustainability delivers maximizing availability by the latest light source for the ArF immersion lithography and KrF lithography

Takeda Yuuki; Takamitsu Komaki; Hirotaka Miyamoto; Tsukasa Hori; Katsuhiko Wakana; Takeshi Ohta; Takashi Saito; Hakaru Mizoguchi

doi:10.1117/12.2658263

14 April 2023 Contributing to sustainability delivers maximizing availability by the latest light source for the ArF immersion lithography and KrF lithography

Takeda Yuuki, Takamitsu Komaki, Hirotaka Miyamoto, Tsukasa Hori, Katsuhiko Wakana, Takeshi Ohta, Takashi Saito, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume PC12494, Optical and EUV Nanolithography XXXVI; PC124940J (2023) https://doi.org/10.1117/12.2658263
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

The global semiconductor market is expanding, and while equipment that maximizes availability is required to manufacture a large number of semiconductors, equipment with low electric power consumption and high productivity is required to realize a sustainable society. The new ArF lightsources developed by Gigaphoton reduce the number of replacement parts required by extending the replacement interval for consumable parts by 20%. The new KrF lightsources reduce the electric power required to produce a wafer by 20%. These have contributed to maximized availability and sustainability.

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Takeda Yuuki, Takamitsu Komaki, Hirotaka Miyamoto, Tsukasa Hori, Katsuhiko Wakana, Takeshi Ohta, Takashi Saito, and Hakaru Mizoguchi "Contributing to sustainability delivers maximizing availability by the latest light source for the ArF immersion lithography and KrF lithography", Proc. SPIE PC12494, Optical and EUV Nanolithography XXXVI, PC124940J (14 April 2023); https://doi.org/10.1117/12.2658263

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