Imaging performance of low-n absorbers at the optical resolution limits of high NA EUV systems

Andreas Erdmann

doi:10.1117/12.3012444

26 September 2023 Imaging performance of low-n absorbers at the optical resolution limits of high NA EUV systems

Andreas Erdmann

Proceedings Volume PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; PC129150F (2023) https://doi.org/10.1117/12.3012444
Event: Photomask Japan 2023, 2023, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2023.

Conference Presentation

Citation Download Citation

Andreas Erdmann "Imaging performance of low-n absorbers at the optical resolution limits of high NA EUV systems", Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150F (26 September 2023); https://doi.org/10.1117/12.3012444

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