CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume PC12958 > Article
Presentation
10 April 2024 Understanding plasma etching of grayscale microlenses and multi-height structures for optoelectronic devices
Assia Selmouni, Aurélien Tavernier, Api Warsono, Sébastien Bérard-Bergery, Nicolas Posseme
Author Affiliations +
Proceedings Volume PC12958, Advanced Etch Technology and Process Integration for Nanopatterning XIII; (2024) https://doi.org/10.1117/12.3010137
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
The latest promising optoelectronic devices require complex 3D structures. In this study, optical grayscale microlenses and multi-height structures are etched into a polymer layer in a Capacitively Coupled Plasma reactor (CCP). Etching can cause profile deformation and surface roughness, which may affect device performances. A parametric study is conducted to investigate 3D etching mechanisms. We observed strong shape modulation by varying plasma parameters. Increasing chamber pressure, or decreasing High Frequency power, show similar tendencies, going from a rounded to a conic profile. Additional experiments suggest that 3D etching mechanisms rely on complex passivation processes and ion bombardment effects.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Assia Selmouni, Aurélien Tavernier, Api Warsono, Sébastien Bérard-Bergery, and Nicolas Posseme "Understanding plasma etching of grayscale microlenses and multi-height structures for optoelectronic devices", Proc. SPIE PC12958, Advanced Etch Technology and Process Integration for Nanopatterning XIII, (10 April 2024); https://doi.org/10.1117/12.3010137
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Plasma etching
Microlens
Optoelectronic devices
Etching
Plasma
Deformation
Passivation
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top