Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides

M. Joseph Roberts; Mark B. Moran; Linda F. Johnson; Will Freeman

doi:10.1117/1.JNP.12.026001

9 April 2018 Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides

M. Joseph Roberts, Mark B. Moran, Linda F. Johnson, Will Freeman

Author Affiliations +

Journal of Nanophotonics, Vol. 12, Issue 2, 026001 (April 2018). https://doi.org/10.1117/1.JNP.12.026001

Abstract

We demonstrate maskless lithography fabrication of nanolayered heterostructured hybrid plasmonic waveguides. This includes the measured optical properties of pulsed magnetron sputtered 15 nm films of aluminum oxide and aluminum nitride. Hybrid plasmonic waveguides, where the modes highest intensity is largely confined to the thin aluminum oxide layer, were constructed by maskless lithography using an aperture-type near-field scanning optical microscope.

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M. Joseph Roberts, Mark B. Moran, Linda F. Johnson, and Will Freeman "Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides," Journal of Nanophotonics 12(2), 026001 (9 April 2018). https://doi.org/10.1117/1.JNP.12.026001

Received: 29 September 2017; Accepted: 7 March 2018; Published: 9 April 2018

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