Improved four-mirror optical system for deep-ultraviolet submicrometer lithography

Jong-Tae Kim; Hong-Jin Kong; Sang-Soo Lee

doi:10.1117/12.61056

1 March 1993 Improved four-mirror optical system for deep-ultraviolet submicrometer lithography

Jong-Tae Kim, Hong-Jin Kong, Sang-Soo Lee

Author Affiliations +

Optical Engineering, Vol. 32, Issue 3, (March 1993). https://doi.org/10.1117/12.61056

Abstract

The design for a rotationally symmetric four-mirror optical system with reduction magnification 5 x for deep UV (λ = 248 nm of a KrF excimer laser) submicrometer lithography is developed. Initially by using the paraxial quantities, numerical solutions are found for the system, which is free from the four off-axial third-order aberrations-coma, astigmatism, field curvature, and distortion. Aspherization is carried out to the spherical mirror surfaces to reduce the axial and residual off-axial higher order aberrations. The numerical aperture of the final system is as large as 0.38, which gives a Rayleigh resolution of 0.4 μm and hence is useful in submicrometer lithographic applications.

Citation Download Citation

Jong-Tae Kim, Hong-Jin Kong, and Sang-Soo Lee "Improved four-mirror optical system for deep-ultraviolet submicrometer lithography," Optical Engineering 32(3), (1 March 1993). https://doi.org/10.1117/12.61056

Published: 1 March 1993

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE