Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild; Jan H. C. Sedlacek

doi:10.1117/12.146852

1 October 1993 Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan H. C. Sedlacek

Author Affiliations +

Optical Engineering, Vol. 32, Issue 10, (October 1993). https://doi.org/10.1117/12.146852

Abstract

he effect of 1 93-nm excimer laser radiation on pellicles designed for 248-nm use is studied. The pellicles are transparent at 1 93 nm as well. However, prolonged irradiation causes gradual thinning and eventual rupture of the pellicle. The rate of change depends on the fluence and on the total dose but is not affected by the presence of atmospheric oxygen. Two-photon absorption plays an important role in the interaction between the laser and the pellicle material. Extrapolation to the approximately 0.1 mJ cm2lpulse fluences expected to be used in 1 93-nm steppers indicates that these pellicles will change little for 5everal years in a full-production environment.

Citation Download Citation

Mordechai Rothschild and Jan H. C. Sedlacek "Laser-induced damage in pellicles at 193 nm," Optical Engineering 32(10), (1 October 1993). https://doi.org/10.1117/12.146852

Published: 1 October 1993

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available