Optimization of the material removal in fluid jet polishing

Hui Fang; Peiji Guo; Jingchi Yu

doi:10.1117/1.2203650

1 May 2006 Optimization of the material removal in fluid jet polishing

Hui Fang, Peiji Guo, Jingchi Yu

Author Affiliations +

Optical Engineering, Vol. 45, Issue 5, 053401 (May 2006). https://doi.org/10.1117/1.2203650

Abstract

Removal-function models play an important role in computer-controlled optical surfacing. We investigate removal-function models of fluid jet polishing experimentally to obtain an optimum one. We adjust the nozzle and let the slurry jet guided by it impact the workpiece with both normal and oblique incidence angle from different positions. The experimental results indicate that when the slurry jet impacts workpiece obliquely from four positions, the profile of material removal approximates to an ideal one with maximum removal at the center, decreasing to zero at the edges. This new removal-function model avoids the disadvantages of the ring-shaped one, and satisfies the requirement of optical manufacturing to obtain a high degree of precision.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Hui Fang, Peiji Guo, and Jingchi Yu "Optimization of the material removal in fluid jet polishing," Optical Engineering 45(5), 053401 (1 May 2006). https://doi.org/10.1117/1.2203650

Published: 1 May 2006

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