Dr. Jeremy Béguelin Profile

Dr. Jeremy Béguelin

Optical Engineer at Focuslight Switzerland SA

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 5 March 2022 Presentation + Paper

Analytical analysis of the optical parameters of lenses for astigmatic beams

Giorgio Quaranta, Jeremy Béguelin, Wilfried Noell, Toralf Scharf, Reinhard Völkel

Proceedings Volume 12007, 120070P (2022) https://doi.org/10.1117/12.2625469

KEYWORDS: Microlens, Lenses, Integrated optics, Aspheric lenses, Photoresist materials, Photonic integrated circuits, Reactive ion etching, Optics manufacturing, Microlens array, Etching

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SPIE Journal Paper | 31 August 2021 Open Access

Commented review on refractive microlenses and microlens arrays metrology

Jeremy Béguelin, Reinhard Voelkel, Toralf Scharf

JOM, Vol. 1, Issue 03, 030901, (August 2021) https://doi.org/10.1117/12.10.1117/1.JOM.1.3.030901

KEYWORDS: Microlens, Metrology, Microscopes, Microlens array, Profilometers, Manufacturing, Micro optics, Optics manufacturing, Optical microsystems, Spherical lenses

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SPIE Journal Paper | 24 March 2021 Open Access

32 × 32 silicon photonic MEMS switch with gap-adjustable directional couplers fabricated in commercial CMOS foundry

Sangyoon Han, Jeremy Beguelin, Lane Ochikubo, John Jacobs, Tae Joon Seok, Kyoungsik Yu, Niels Quack, Chang-Kyu Kim, Richard Muller, Ming Wu

JOM, Vol. 1, Issue 02, 024003, (March 2021) https://doi.org/10.1117/12.10.1117/1.JOM.1.2.024003

KEYWORDS: Switches, Directional couplers, Silicon photonics, Waveguides, Microelectromechanical systems, Switching, Silicon, Actuators, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 30 August 2019 Presentation + Paper

Specification of aspherical surfaces used as refractive elements in micro-optical systems

Jeremy Béguelin, Toralf Scharf, Wilfried Noell, Reinhard Voelkel

Proceedings Volume 11103, 1110309 (2019) https://doi.org/10.1117/12.2528636

KEYWORDS: Microlens, Tolerancing, Wavefront aberrations, Optics manufacturing, Geometrical optics, Optical design, Ray tracing, Imaging systems, Zernike polynomials

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Proceedings Article | 30 August 2019 Presentation + Paper

Leveraging wafer-level manufacturing process limitations to increase large-scale fused silica microlens array uniformity

Raoul Kirner, Jeremy Béguelin, Wilfried Noell, Toralf Scharf, Reinhard Voelkel, Martin Eisner

Proceedings Volume 11103, 111030A (2019) https://doi.org/10.1117/12.2529195

KEYWORDS: Microlens, Picture Archiving and Communication System, Microlens array, Wafer-level optics, Manufacturing, Optics manufacturing, Tolerancing, Reactive ion etching, Semiconducting wafers

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