Multipass lithography of HSQ etch masks for fabrication of low-loss alumina waveguides for blue light applications

Elissa McKay; Natale Pruiti; Stuart May; Marc Sorel

doi:10.1117/12.2649140

17 March 2023 Multipass lithography of HSQ etch masks for fabrication of low-loss alumina waveguides for blue light applications

Elissa McKay, Natale Pruiti, Stuart May, Marc Sorel

Author Affiliations +

Proceedings Volume PC12424, Integrated Optics: Devices, Materials, and Technologies XXVII; PC1242403 (2023) https://doi.org/10.1117/12.2649140
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

Optical waveguides which are highly transparent to blue and ultraviolet light are critical for a range of photonic integrated circuit (PIC) applications in sensing and quantum timing. At short wavelengths, propagation loss is heavily dependent on sidewall roughness, which is largely determined by lithography and etching processes. We evaluate the effectiveness of multipass e-beam lithography (EBL) in producing low-roughness hydrogen silesquioxane (HSQ) masks, establish the effect of multipass EBL on optical loss in the visible regime, and use our optimised HSQ masking process to fabricate high-confinement single-mode alumina waveguides with propagation losses down to 1.0 dB/cm at 450 nm.

Conference Presentation

Citation Download Citation

Elissa McKay, Natale Pruiti, Stuart May, and Marc Sorel "Multipass lithography of HSQ etch masks for fabrication of low-loss alumina waveguides for blue light applications", Proc. SPIE PC12424, Integrated Optics: Devices, Materials, and Technologies XXVII, PC1242403 (17 March 2023); https://doi.org/10.1117/12.2649140

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