Transparent conductive nanostructures with low refractive index

Astrid Bingel; Friedrich Rickelt; Peter Munzert; Ulrike Schulz; Sven Schröder

doi:10.1117/12.3023023

18 June 2024 Transparent conductive nanostructures with low refractive index

Astrid Bingel, Friedrich Rickelt, Peter Munzert, Ulrike Schulz, Sven Schröder

Proceedings Volume PC13020, Advances in Optical Thin Films VIII; PC1302007 (2024) https://doi.org/10.1117/12.3023023
Event: SPIE Optical Systems Design, 2024, Strasbourg, France

Abstract

Transparent and conductive oxides offer metal-like conductivity and high transmission in the visible spectrum. However, they suffer from reflection losses at the film interface due to their high refractive index. A method for producing an ITO nanostructure through plasma etching in a conventional deposition plant equipped with an APS plasma source is presented, resulting in conductive nanostructures with an effective refractive index as low as 1.3. This nanostructure was combined with an AR coating achieving minimal reflectance while maintaining a conductive surface that enables the removal of surface charges as it is needed in AR coatings for quantum computing applications.

Conference Presentation

Citation Download Citation

Astrid Bingel, Friedrich Rickelt, Peter Munzert, Ulrike Schulz, and Sven Schröder "Transparent conductive nanostructures with low refractive index", Proc. SPIE PC13020, Advances in Optical Thin Films VIII, PC1302007 (18 June 2024); https://doi.org/10.1117/12.3023023

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