Paper
30 June 1982 State Of The Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance
Wayne M. Moreau
Author Affiliations +
Abstract
The acrylate family of resists have been the most popular choice of positive resists for advanced lithography. Over the last decade, polymethylmethacrylate (PMMA) and derivatives of the general formula continue to show improved performance
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wayne M. Moreau "State Of The Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933404
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Polymethylmethacrylate

Plasma

Polymers

Resistance

Lithography

Technetium

Manganese

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