Performance Of Sputter Deposited Multi Layer X-Ray Mirrors

M Arbaoui; R Barchewitz; C. Sella; K B Youn

doi:10.1117/12.938396

13 October 1986 Performance Of Sputter Deposited Multi Layer X-Ray Mirrors

M Arbaoui, R Barchewitz, C. Sella, K B Youn

Proceedings Volume 0652, Thin Film Technologies II; (1986) https://doi.org/10.1117/12.938396
Event: 1986 International Symposium/Innsbruck, 1986, Innsbruck, Austria

Abstract

Multilayer X-ray mirrors have been deposited by triode dc sputtering using a new method of thickness monitoring which is based on the dependence of the deposition rate on the target current. Thicknesses can be controlled with an accuracy of better than 0.1 ⟨. High efficiency W-C, and Ni-C multilayer mirrors have been synthesized and tested at 1.54 Å (Cu Kα) and 44.79 Å (CK,α). Absolute reflectivity measurements at λ = 44.79⟨ (CKD) have been carried out. In this case the incident beam is previously polarized by a premonochromator equipped with a pair of parallel plane multilayer mirrors fixed at an angle close to Brewster's one (0---,45°). Thus the measured reflectivities are not affected by a progressive variation of the P component.

Citation Download Citation

M Arbaoui, R Barchewitz, C. Sella, and K B Youn "Performance Of Sputter Deposited Multi Layer X-Ray Mirrors", Proc. SPIE 0652, Thin Film Technologies II, (13 October 1986); https://doi.org/10.1117/12.938396

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