Paper
22 April 1987 Picosecond Transient Reflectivity Of Photowashed Gallium Arsenide Surfaces
J. E. Wessel, S. M. Beck, D. C. Marvin
Author Affiliations +
Proceedings Volume 0794, Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices; (1987) https://doi.org/10.1117/12.940920
Event: Advances in Semiconductors and Semiconductor Structures, 1987, Bay Point, FL, United States
Abstract
Picosecond transient reflectivity was applied to measure surface recombination processes in intrinsic and n-doped GaAs. Photowashed surfaces were characterized by slow recombination and the results imply flat band conditions were achieved. Unwashed samples are characterized by rapid, complex surface charge carrier kinetics.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. E. Wessel, S. M. Beck, and D. C. Marvin "Picosecond Transient Reflectivity Of Photowashed Gallium Arsenide Surfaces", Proc. SPIE 0794, Modern Optical Characterization Techniques for Semiconductors and Semiconductor Devices, (22 April 1987); https://doi.org/10.1117/12.940920
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KEYWORDS
Gallium arsenide

Reflectivity

Picosecond phenomena

Laser beam diagnostics

Diffusion

Semiconductors

Data modeling

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