Integrated Optical Interferometer On Silicon Substrates

W. Gleine; J. Muller

doi:10.1117/12.949415

5 April 1989 Integrated Optical Interferometer On Silicon Substrates

W. Gleine, J. Muller

Proceedings Volume 1014, Micro-Optics; (1989) https://doi.org/10.1117/12.949415
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Integrated optical components like directional couplers, Y-junctions, mirrors and polarizers have been realized to generate an integrated optical Michelson interferometer on silicon substrates. A good quality waveguide material with reasonable low attenuation (below 0.5 dB/cm at λ = 632.8 nm for filmwaveguides ) a uniformity better than 3% and an adjustable refractive index between 1.46 and 2 is the LPCVD deposited siliconoxinitride , which can be trimmed by thermal annealing (▵n up to 2%, ▵d = 2-10%). The basic geometry of the components is a strip loaded waveguide, which has been obtained by photolithography and plasma-etching. The losses of such waveguides due to surface scattering were about 1 dB/cm for monomode waveguiding at λ=632.8 nm.

Citation Download Citation

W. Gleine and J. Muller "Integrated Optical Interferometer On Silicon Substrates", Proc. SPIE 1014, Micro-Optics, (5 April 1989); https://doi.org/10.1117/12.949415

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