Advances in source power have enabled a further increase of tool productivity requiring an associated increase of stage scan speeds. To maximize the number of yielding die per day a stringent Overlay, Focus, and Critical Dimension (CD) control is required. Tight CD control at improved resolution is obtained through a number of innovations: the NXE:3400B features lower aberration levels and a revolutionary new illumination system, offering improved pupil-fill ratio and larger sigma range. Overlay and Focus are further improved by implementation of a new wafer clamp and improved scanner controls. The NXE:3400B also offers full support for reticle pellicles. |
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CITATIONS
Cited by 24 scholarly publications.
Extreme ultraviolet
Pellicles
Fiber optic illuminators
Scanners
Extreme ultraviolet lithography
Reticles
Particles