Paper
19 October 2016 Research on marking lines of silicone elastomer PDMS for super-hydrophobic surface fabrication based on picosecond laser
Xiao Gang, Shiyun Dong, Shixing Yan, Chaoqun Song, Bin Wang
Author Affiliations +
Proceedings Volume 10153, Advanced Laser Manufacturing Technology; 1015317 (2016) https://doi.org/10.1117/12.2247455
Event: International Symposium on Optoelectronic Technology and Application 2016, 2016, Beijing, China
Abstract
The picosecond laser has ultrashort pulse and superstrong peak power, which make it being focused on and applied in the micro-nanoscale fabrication field. Silicone elastomer PDMS is a typical antifouling material which can desorb defacement, using picosecond laser etching the surface through the way of galvanometer scanning in order to obtain a surface with micro-nano texture. The article studied the relationship between process parameters such as the power density, the scanning rate and the appearance of etched groove respectively, especially the width and depth of the groove. The results show that : for single marking, with the raise of the laser power density I, the depth of the groove increases, the inclination angle of the side wall is reduced. In another time, with the increase of the scanning rate v ,the depth of the groove decreases gradually and the surface morphology cannot be seen clearly. For multiple marking, the depth of the groove shown a falling slope from big to small with the increase of marking number. Finally,we got a path to optimize the process parameters to obtain a surface with micro-nano structures. After testing the surface contact angle, we found that the surface contact angle increased from 113° to 152°,which reached the level of superhydrophobic surface.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiao Gang, Shiyun Dong, Shixing Yan, Chaoqun Song, and Bin Wang "Research on marking lines of silicone elastomer PDMS for super-hydrophobic surface fabrication based on picosecond laser", Proc. SPIE 10153, Advanced Laser Manufacturing Technology, 1015317 (19 October 2016); https://doi.org/10.1117/12.2247455
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KEYWORDS
Picosecond phenomena

Semiconductor lasers

Silicon

Laser marking

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