CMOS compatible thermal tunable planar silicon etched diffraction gratings

Jun Li; Chao Qiu; Xin Chen; Zhen Sheng; Aimin Wu; Fuwan Gan

doi:10.1117/12.2266336

5 January 2017 CMOS compatible thermal tunable planar silicon etched diffraction gratings

Jun Li, Chao Qiu, Xin Chen, Zhen Sheng, Aimin Wu, Fuwan Gan

Proceedings Volume 10244, International Conference on Optoelectronics and Microelectronics Technology and Application; 1024429 (2017) https://doi.org/10.1117/12.2266336
Event: International Conference on Optoelectronics and Microelectronics Technology and Application, 2016, Shanghai, China

Abstract

A five-channel silicon etched diffraction gratings (EDGs) working in the O-band was demonstrated in this paper. The device has a channel spacing of 20 nm and occupies a footprint of 180μm×120μm with an insertion loss of 5.3dB. Integrated heaters were designed to compensate the center wavelength shifts brought from fabrication errors. A tuning efficiency of 0.358nm/mA was obtained finally.

Citation Download Citation

Jun Li, Chao Qiu, Xin Chen, Zhen Sheng, Aimin Wu, and Fuwan Gan "CMOS compatible thermal tunable planar silicon etched diffraction gratings", Proc. SPIE 10244, International Conference on Optoelectronics and Microelectronics Technology and Application, 1024429 (5 January 2017); https://doi.org/10.1117/12.2266336

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KEYWORDS

Diffraction gratings

Silicon

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