Silicon-silicon nitride coatings for reduced angle and polarization sensitivity

Justin Mosier; Bruce Lairson

doi:10.1117/12.719783

14 May 2007 Silicon-silicon nitride coatings for reduced angle and polarization sensitivity

Justin Mosier, Bruce Lairson

Proceedings Volume 10316, Optifab 2007: Technical Digest; 103161L (2007) https://doi.org/10.1117/12.719783
Event: Optifab 2007, 2007, Rochester, New York, United States

Abstract

Durable silicon–silicon nitride films have been created that exhibit low angle shift and reduced s and p polarization separation. The more common silicon dioxide – metal oxide films often have performance problems at large angles. They are inherently sensitive to angle of incidence and thus are prone to alignment issues and cone angle effects of the incident light. In contrast, silicon–silicon nitride films have much higher average optical indices and thus are ideal for applications were spectral form and placement are critical at large angles of incidence and when cone angle considerations are important. In addition, the difference in the spectral performance between the s and p polarizations is greatly reduced with silicon–silicon nitride films, offering more alignment flexibility when polarized sources are required. The silicon–silicon nitride films were found to be environmentally durable, and can be applied to a variety of substrates and substrate geometries, including plano, spherical domes, and complex parabolic surfaces.

Citation Download Citation

Justin Mosier and Bruce Lairson "Silicon-silicon nitride coatings for reduced angle and polarization sensitivity", Proc. SPIE 10316, Optifab 2007: Technical Digest, 103161L (14 May 2007); https://doi.org/10.1117/12.719783

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