eBeam initiative surveys report greatly increased confidence in EUV and  mask process correction requirements

Aki Fujimura; Jan Willis

doi:10.1117/12.2323961

12 June 2018 eBeam initiative surveys report greatly increased confidence in EUV and mask process correction requirements

Aki Fujimura, Jan Willis

Author Affiliations +

Proceedings Volume 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology; 108070C (2018) https://doi.org/10.1117/12.2323961
Event: Photomask Japan 2018, 2018, Yokohama, Japan

Abstract

The eBeam Initiative completed its third annual mask makers’ survey in 2017 with anonymous feedback from 10 captive and merchant photomask manufacturers. Participation in the 2017 eBeam Initiative perceptions survey increased to more than 40 different companies versus 30 companies the previous year. In 2017, 75 industry luminaries responded from across the semiconductor ecosystem.

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Aki Fujimura and Jan Willis "eBeam initiative surveys report greatly increased confidence in EUV and mask process correction requirements", Proc. SPIE 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 108070C (12 June 2018); https://doi.org/10.1117/12.2323961

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