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3 October 2018 Debris-free high-brightness light source based on LPP for actinic EUV microscopy and metrology applications
Konstantin Koshelev, Alexander Vinokhodov, Oleg Yakushev, Alexey Yakushkin, Dimitri Abramenko, Alexander Lash, Mikhail Krivokorytov, Yuri Sidelnikov, Vladimir Ivanov, Vladimir Krivtsun, Vyacheslav Medvedev, Denis Glushkov, Pavel Seroglazov, Samir Ellwi, Rainer Lebert
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Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 108091Q (2018) https://doi.org/10.1117/12.2501812
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States
Abstract
The progress of EUVL and the introduction of HVM scanners demands advanced actinic metrology especially for the EUV mask supply chain. For stand alone field use reliable metrology sources for EUV inband emission around 13.5 nm are critically needed. For nanometer resolution the effective “inband brightness” is extremely important. Laser produced EUV sources (LPP) are cost effective with efficient energy use thus providing a reliable approach for real-life industrial applications. However, apart from the Cymer/ASML LPP scanner source no such source is available. One reason is that realizing a reliable tin droplet target is beyond the technical and financial scope of a metrology source. In this paper, we propose a path to make industrial laser produced plasma based EUV sources reliable and with easy renewable targets a reality.
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Konstantin Koshelev, Alexander Vinokhodov, Oleg Yakushev, Alexey Yakushkin, Dimitri Abramenko, Alexander Lash, Mikhail Krivokorytov, Yuri Sidelnikov, Vladimir Ivanov, Vladimir Krivtsun, Vyacheslav Medvedev, Denis Glushkov, Pavel Seroglazov, Samir Ellwi, and Rainer Lebert "Debris-free high-brightness light source based on LPP for actinic EUV microscopy and metrology applications", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091Q (3 October 2018); https://doi.org/10.1117/12.2501812
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KEYWORDS
Lithium
Extreme ultraviolet
Tin
Pulsed laser operation
Metrology
Extreme ultraviolet lithography
Super resolution microscopy
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