Application of submicron Linewidth Measuring Technique To Photomasks

Nelda D. Clelland; Geoff S. Glaspie

doi:10.1117/12.953084

19 July 1989 Application of submicron Linewidth Measuring Technique To Photomasks

Nelda D. Clelland, Geoff S. Glaspie

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953084
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

This paper describes how a technique was developed to make precise and accurate submicron linewidth measurements on photomasks which takes advantage of the inherent benefits of both optical and electrical measurement techniques. We present the theory of operation for both the optical and electrical equipment used, and the theory behind the electrical test structure design. Test mask development includes the materials (types of chrome and glass), processing, and test structure design. The optical and electrical test procedures are discussed, with emphasis placed on set-up and sample preparation. Test results are summarized and conclusions are drawn based on data analysis. Finally, we show how this integrated technique of submicron measurement of photomasks is applied in a production environment.

Citation Download Citation

Nelda D. Clelland and Geoff S. Glaspie "Application of submicron Linewidth Measuring Technique To Photomasks", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953084

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