The Application Of Ion Beam Assisted Deposition Of Chrome To Photomask Repair

W. P. Robinson

doi:10.1117/12.968531

1 August 1989 The Application Of Ion Beam Assisted Deposition Of Chrome To Photomask Repair

W. P. Robinson

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968531
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The MicroBeam NanoFix-50 photomask repair system and the NanoFab-150 nanolithography system are advanced focused ion beam systems which can produce highintensity beams having current densities exceeding 5A/cm². When such a high current density beam interacts with a solid, significant sputtering, heating, and implantation result. Localized power densities up to 750kW/cm² can be present. In addition, ambient gas molecules impact the surface under bombardment, interacting physically and chemically, modifying the top atomic layers of the solid. The conditions at the beam impact point are thus extreme and complex.

Citation Download Citation

W. P. Robinson "The Application Of Ion Beam Assisted Deposition Of Chrome To Photomask Repair", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968531

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