Presentation + Paper
25 March 2019 Accelerate the analysis and optimization of lamellar BCP process using machine learning
Author Affiliations +
Abstract
This paper presents how to use machine learning to accelerate the development of lamellar block copolymer process. The first part introduces an automated algorithm to measure lamellar CD-SEM images oriented to allow fast images screening, identify and select the most relevant chemical composition. The second part is the use of machine learning in the process development which is a data driven approach. This part is also divided in two sections, the first one for the prediction of the process, where having a set of experiments in a process window, a model is created so that the outcome from is estimated from different parameters. The second part is the estimation of the process window. These tools are oriented to assist process engineers in the process optimization which must be driven under expert supervision.
Conference Presentation
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Derville, S. Martinez, G. Gey, J. Baderot, G. Bernard, X. Chevalier, and J. Foucher "Accelerate the analysis and optimization of lamellar BCP process using machine learning", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 109600Z (25 March 2019); https://doi.org/10.1117/12.2514955
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Machine learning

Image processing

Data modeling

Process engineering

Data analysis

Image analysis

Line edge roughness

Back to Top