The efficiency and quality of silicon micromachining above the ablation threshold: a comparison for femto, pico and nanosecond laser

Ryszard Pawlak; Mariusz Tomczyk; Maria Walczak; Piotr Sęk; Mateusz Tański

doi:10.1117/12.2519532

4 December 2018 The efficiency and quality of silicon micromachining above the ablation threshold: a comparison for femto, pico and nanosecond laser

Ryszard Pawlak, Mariusz Tomczyk, Maria Walczak, Piotr Sęk, Mateusz Tański

Author Affiliations +

Proceedings Volume 10974, Laser Technology 2018: Progress and Applications of Lasers; 109740X (2018) https://doi.org/10.1117/12.2519532
Event: Thirteenth Symposium on Laser Technology, 2018, Jastarnia, Poland

Abstract

In the paper the results of 3D micromachining of silicon using nanosecond (1064 nm), picosecond (343 nm) and femtosecond (343 nm) laser pulses are presented. Effective laser processing demands repeated scanning of the laser beam and overlapping of paths what generate many phenomena which do not occur by impact of individual laser pulses. Thermal incubation effect and shielding of laser beam by ejected particles compete and decide on the final result of ablative micromachining. Applying femto and picosecond laser pulses does not directly guarantee expected quality and effectiveness.

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Ryszard Pawlak, Mariusz Tomczyk, Maria Walczak, Piotr Sęk, and Mateusz Tański "The efficiency and quality of silicon micromachining above the ablation threshold: a comparison for femto, pico and nanosecond laser", Proc. SPIE 10974, Laser Technology 2018: Progress and Applications of Lasers, 109740X (4 December 2018); https://doi.org/10.1117/12.2519532

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