Presentation + Paper
25 February 2020 Atomic flux circuits
Douglas G. Bopp, Ellyse Taylor, Khoa Le, Susan Schima, Matthew T. Hummon, John Kitching
Author Affiliations +
Abstract
Atomic vapors are a crucial platform for precision metrology but in their simplest implementation, a thermal vapor, the intrinsic optical resonances are broadened due to the random and isotropic thermal motion of the atoms. By structuring the container of a thermal vapor with narrow emission apertures, the velocity distribution can be modified to create a directed beam of atoms.1 These atomic beams can then interact sequentially with a series of optical fields, or interaction zones, and ultimately allow precision control over the internal state of the atom. This is useful for optical frequency standards and precision spectroscopy2, 3 and may also provide the means to build a simple flying qubit platform.4 Furthermore, atomic beams on a chip can be used as a compact, directed source to load magneto-optical traps (MOTs) while minimally increasing the ambient pressure.5 We apply microfabrication techniques to microscopically structure silicon to deterministically control the ow of Rb between connected cavities. We describe a methodology to measure the experimental parameters that govern the flux of atomic vapors in these microfabricated structures with a goal of creating an equivalent electrical circuit model. This toolkit will provide a simple platform for the creation of atomic beams on a chip with controllable pressure profiles and a thorough understanding of the influence of adsorptive effects and pseudo- ballistic trajectories on the resultant atomic beam.
Conference Presentation
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Douglas G. Bopp, Ellyse Taylor, Khoa Le, Susan Schima, Matthew T. Hummon, and John Kitching "Atomic flux circuits", Proc. SPIE 11296, Optical, Opto-Atomic, and Entanglement-Enhanced Precision Metrology II, 112961O (25 February 2020); https://doi.org/10.1117/12.2552585
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KEYWORDS
Rubidium

Chemical species

Semiconducting wafers

Silicon

Microfabrication

Optical resonators

Oxides

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