Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Yutaka Shiraishi; Tatsuya Yanagida; Georg Soumagne; Tsuyoshi Yamada; Takashi Saitou

doi:10.1117/12.2549905

23 March 2020 Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou

Author Affiliations +

Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 113230X (2020) https://doi.org/10.1117/12.2549905
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Gigaphoton develops CO₂-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL. Unique and original technologies including; combination of pulsed CO₂ laser and Sn droplets, dual wavelength laser pulses for shooting and debris mitigation by magnetic field have been applied. We have developed first practical source for HVM; “GL200E” in 2014. Then it is demonstrated which high average power CO₂laser more than 20kW at output power in cooperation with Mitsubishi Electri. Pilot#1 is up running and it demonstrates HVM capability; EUV power recorded at 111W on average (117W in burst stabilized, 95% duty) with 5% conversion efficiency for 22 hour operation in October 2016. Availability is achievable at 89% (2 weeks average), also superior magnetic mitigation has demonstrated promising mirror degradation rate (= 0.5%/Gp) at 100W or higher power operation with dummy mirror test. We have demonstrated actual collector mirror reflectivity degradation rate is less than 0.4%/Gp by using real collector mirror around 125W (at I/F clean) in burst power during 30 Billion pulses operation. Recently we have redefined target power higher >330W and its development plan. Also we will update latest challenges for >330W average operation with actual collector mirror at the conference.

Conference Presentation

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Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, and Takashi Saitou "Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113230X (23 March 2020); https://doi.org/10.1117/12.2549905

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