Mr. Hiroaki Nakarai Profile

Hiroaki Nakarai

at Gigaphoton Inc

SPIE Involvement:

Author

Publications (49)

Proceedings Article | 21 November 2023 Poster + Paper

High-brightness and compact LPP EUV source for inspection system

Yasutsugu Usami, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Takuya Ishii, Tsuyoshi Yamada, Hiroaki Nakarai

Proceedings Volume 12751, 1275116 (2023) https://doi.org/10.1117/12.2686231

KEYWORDS: Extreme ultraviolet, Light sources, Inspection, Tin, Extreme ultraviolet lithography, Metrology, Plasma, Collector mirrors, Pellicles, Laser irradiation

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Proceedings Article | 21 November 2023 Poster + Paper

Development progress of Sn-LPP EUV light source for inspection systems

Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou

Proceedings Volume 12750, 127500V (2023) https://doi.org/10.1117/12.2686618

KEYWORDS: Extreme ultraviolet, Light sources, Inspection, Laser irradiation, Collector mirrors, Tin, Laser applications, Semiconductors, Reliability, Plasma

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Proceedings Article | 28 April 2023 Poster + Paper

Development progress of key components for LPP-EUV light sources

Hiroaki Tomuro, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 12494, 1249411 (2023) https://doi.org/10.1117/12.2657640

KEYWORDS: Extreme ultraviolet, Tin, Collector mirrors, Laser irradiation, Light sources, Plasma, Ions, Gas lasers, Hydrogen, Control systems

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Proceedings Article | 1 December 2022 Paper

High-power LPP-EUV source for semiconductor HVM: lithography and other applications

Hakaru Mizoguchi, Hiroaki Nakarai, Yasutsugu Usami, Kouji Kakizaki, Junichi Fujimoto, Takashi Saitou

Proceedings Volume 12292, 122920X (2022) https://doi.org/10.1117/12.2657787

KEYWORDS: Extreme ultraviolet, Mirrors, Deep ultraviolet, Lithography, Light sources, Carbon dioxide lasers, Laser systems engineering, Semiconductors, Photomasks, Inspection

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Proceedings Article | 26 May 2022 Poster + Presentation + Paper

Key technology development progress of the high power LPP-EUV light source

Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proceedings Volume 12051, 120510T (2022) https://doi.org/10.1117/12.2612778

KEYWORDS: Extreme ultraviolet, Tin, Control systems, Light sources, Plasma, Pulsed laser operation, Ions

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Proceedings Article | 13 October 2021 Presentation + Paper

Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Tomuro, Yuichi Nishimura, Hirokazu Hosoda, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tatsuya Yanagiga, Georg Soumagne, Fumio Iwamoto, Shinji Nagai, Yoshifumi Ueno, Takashi Suganuma, Gouta Niimi, Takayuki Yabu, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11854, 118540K (2021) https://doi.org/10.1117/12.2600714

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Plasma, Laser systems engineering, Extreme ultraviolet lithography, Light sources, Reflectivity, Laser development

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Proceedings Article | 23 February 2021 Presentation + Paper

Challenge of >300W high power LPP-EUV source with long mirror lifetime-III for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanak, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, George Sumangne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11609, 1160919 (2021) https://doi.org/10.1117/12.2581910

KEYWORDS: Mirrors, Semiconductors, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Magnetism, Light sources, Tin, Reflectivity

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

The development progress of the high power LPP-EUV light source using a magnetic field

Hirokazu Hosoda, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Yoshifumi Ueno, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proceedings Volume 11609, 116091G (2021) https://doi.org/10.1117/12.2582855

KEYWORDS: Light sources, Tin, Magnetism, Extreme ultraviolet, Mirrors, Ions, Reflectivity, Sputter deposition, Semiconductors, Semiconductor manufacturing

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Proceedings Article | 21 September 2020 Poster + Presentation

Development progress update of the high power LPP-EUV light source using a magnetic field

Takahiro Tatsumi, Yoshifumi Ueno, Takayuki Yabu, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Hakaru Mizoguchi

Proceedings Volume 11517, 1151717 (2020) https://doi.org/10.1117/12.2572689

KEYWORDS: Tin, Light sources, Mirrors, Magnetism, Extreme ultraviolet, Carbon dioxide lasers, Hydrogen, Chemical species, Pulsed laser operation, Reflectivity

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Proceedings Article | 20 September 2020 Presentation

Update of >300W high power LPP-EUV source challenge for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Yoshifumi Ueno, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou, Hirokazu Hosoda, Hiroaki Tomuro, Shinji Nagai, Gouta Niimi, Takashi Suganuma

Proceedings Volume 11517, 115170Q (2020) https://doi.org/10.1117/12.2574707

KEYWORDS: Mirrors, Semiconductors, Extreme ultraviolet, Carbon dioxide lasers, Extreme ultraviolet lithography, Light sources, Magnetism, Magnetic semiconductors, Tin, Pulsed laser operation

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Proceedings Article | 23 March 2020 Paper

Update of development progress of the high power LPP-EUV light source using a magnetic field

Gouta Niimi, Shinji Nagai, Tsukasa Hori, Yoshifumi Ueno, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11323, 1132328 (2020) https://doi.org/10.1117/12.2544051

KEYWORDS: Gas lasers, Carbon monoxide, Extreme ultraviolet, Tin, Mirrors, Magnetism, Plasma, Light sources, Control systems, Pulsed laser operation

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Proceedings Article | 23 March 2020 Presentation + Paper

Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11323, 113230X (2020) https://doi.org/10.1117/12.2549905

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Mirrors, Tin, Plasma, Light sources, Extreme ultraviolet lithography, Reflectivity, Magnetism, Laser development

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Proceedings Article | 26 September 2019 Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Yuta Takashima, Yoshifumi Ueno, Takayuki Yabu, Tsukasa Hori, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yutaka Shiraishi, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11147, 111471M (2019) https://doi.org/10.1117/12.2536397

KEYWORDS: Extreme ultraviolet, Light sources

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Proceedings Article | 26 September 2019 Presentation + Paper

Challenge of high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11147, 1114705 (2019) https://doi.org/10.1117/12.2534147

KEYWORDS: Mirrors, Semiconductors, Reflectivity

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Proceedings Article | 6 June 2019 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for semiconductor high-volume manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10957, 1095716 (2019) https://doi.org/10.1117/12.2514033

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Mirrors, Tin, Plasma, Light sources, Laser development, Ions, Extreme ultraviolet lithography, Magnetism

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Proceedings Article | 26 March 2019 Paper

Update of the development progress of the high power LPP-EUV light source using a magnetic field

Atsushi Ueda, Shinji Nagai, Tsukasa Hori, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10957, 109571S (2019) https://doi.org/10.1117/12.2514809

KEYWORDS: Tin, Gas lasers, Extreme ultraviolet, Magnetism, Carbon monoxide, Mirrors, Plasma, Light sources, Pulsed laser operation, Semiconductors

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Proceedings Article | 12 October 2018 Presentation

Long collector mirror lifetime demonstration around 100W average LP-EUV source for semiconductor high volume manufacturing (Conference Presentation)

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodema, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10809, 1080906 (2018) https://doi.org/10.1117/12.2502015

KEYWORDS: Mirrors, Extreme ultraviolet, Carbon dioxide lasers, Semiconductor manufacturing, Semiconductors, High volume manufacturing, Light sources, Extreme ultraviolet lithography, Magnetism, Lithography

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Proceedings Article | 3 October 2018 Paper

Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

Yuichi Nishimura, Tsukasa Hori, Takayuki Yabu, Katsuhiko Wakana, Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10809, 108091M (2018) https://doi.org/10.1117/12.2500356

KEYWORDS: Extreme ultraviolet, Tin, Gas lasers, Magnetism, Light sources, Mirrors, Plasma, Picosecond phenomena, Semiconductors

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Proceedings Article | 19 March 2018 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamatsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, George Soumangne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10583, 1058318 (2018) https://doi.org/10.1117/12.2299300

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 19 March 2018 Paper

Key components development progress updates of the 250W high-power LPP-EUV light source

Yoshifumi Ueno, Tsukasa Hori, Yasufumi Kawasuji, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10583, 1058328 (2018) https://doi.org/10.1117/12.2283066

KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Magnetism, Pulsed laser operation

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Proceedings Article | 16 October 2017 Paper

Key components development progress updates of the 250W high power LPP-EUV light source

Takayuki Yabu, Yasufumi Kawasuji, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Kenichi Miyao, Takuya Ishii, Yukio Watanabe, Tatsuya Yanagida, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10450, 104501C (2017) https://doi.org/10.1117/12.2280503

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Mirrors, Light sources, Magnetism, Solid state lasers, Control systems, Laser stabilization

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Proceedings Article | 16 October 2017 Presentation + Paper

High-power LPP-EUV source with long collector mirror lifetime for high volume semiconductor manufacturing

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou

Proceedings Volume 10450, 104500Z (2017) https://doi.org/10.1117/12.2281129

KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Performance of 250W high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10143, 101431J (2017) https://doi.org/10.1117/12.2256652

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Lithography, Extreme ultraviolet lithography, Plasma, Tin, Pulsed laser operation, Laser development, Gas lasers, Carbon monoxide, Amplifiers

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Proceedings Article | 24 March 2017 Paper

Key components technology update of the 250W high-power LPP-EUV light source

Yasufumi Kawasuji, Krzysztof Nowak, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi, Yutaka Shiraishi

Proceedings Volume 10143, 101432G (2017) https://doi.org/10.1117/12.2257808

KEYWORDS: Carbon dioxide lasers, Light sources, Pulsed laser operation, Tin, Extreme ultraviolet, High power lasers, Solid state lasers, Magnetism, Gas lasers, Carbon monoxide, Laser applications, Amplifiers, Semiconductors

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Proceedings Article | 22 February 2017 Open Access

Development of 250W EUV light source for HVM lithography

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 10097, 1009702 (2017) https://doi.org/10.1117/12.2261075

KEYWORDS: Extreme ultraviolet, Light sources, Lithography, Carbon dioxide lasers, Tin, Extreme ultraviolet lithography, Gas lasers, Carbon monoxide, Amplifiers, Plasma, Pulsed laser operation, Mirrors

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Proceedings Article | 13 January 2017 Paper

LPP-EUV light source for HVM lithography

T. Saito, Y. Ueno, T. Yabu, A. Kurosawa, S. Nagai, T. Yanagida, T. Hori, Y. Kawasuji, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, H. Mizoguchi

Proceedings Volume 10254, 102541A (2017) https://doi.org/10.1117/12.2257464

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Magnetism, Laser applications, Mirrors, Plasma, Ions

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Proceedings Article | 13 January 2017 Paper

QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

Krzysztof Michał Nowak, Takashi Suganuma, Yoshiaki Kurosawa, Takeshi Ohta, Yasufumi Kawasuji, Hiroaki Nakarai, Takashi Saitou, Junichi Fujimoto, Hakaru Mizoguchi, Akira Sumitani, Akira Endo

Proceedings Volume 10254, 102540W (2017) https://doi.org/10.1117/12.2256003

KEYWORDS: Carbon dioxide lasers, Pulsed laser operation, Oscillators, Gas lasers, Carbon monoxide, Quantum cascade lasers, Extreme ultraviolet, Laser applications, Semiconductor lasers, Optical amplifiers

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Proceedings Article | 18 March 2016 Paper

Performance of new high-power HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9776, 97760J (2016) https://doi.org/10.1117/12.2218405

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Lithography, High power lasers, Carbon dioxide, Laser systems engineering, Amplifiers, Tin, Pulsed laser operation, Light sources, Plasma, Magnetism, Extreme ultraviolet lithography, Ions

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Proceedings Article | 18 March 2016 Paper

100W EUV light-source key component technology update for HVM

Tsukasa Hori, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tamotsu Abe, Takeshi Okamoto, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 9776, 977625 (2016) https://doi.org/10.1117/12.2217947

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Plasma, Light sources, Laser systems engineering, High power lasers, Control systems, Mirrors, Lithography, Ions

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Proceedings Article | 13 March 2015 Paper

Performance of one hundred watt HVM LPP-EUV source

Proceedings Volume 9422, 94220C (2015) https://doi.org/10.1117/12.2086347

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Pulsed laser operation, Laser systems engineering, Magnetism, Mirrors, Ions

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Proceedings Article | 13 March 2015 Paper

Key components technology update of 100W HVM EUV source

Taku Yamazaki, Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9422, 94222P (2015) https://doi.org/10.1117/12.2180269

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Light sources, Magnetism, Mirrors, Ions, Carbon dioxide, Laser applications

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Proceedings Article | 17 April 2014 Paper

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Proceedings Volume 9048, 90480D (2014) https://doi.org/10.1117/12.2046776

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Light sources, Plasma, Pulsed laser operation, Amplifiers, Laser systems engineering, Magnetism

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Since 2002, we have been developing a CO₂-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO₂ laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO₂ laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO₂ amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO₂ laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy ¹). In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO₂ laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO₂ laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP light source unit is 2015.

Proceedings Article | 8 April 2013 Paper

LPP-EUV light source development for high volume manufacturing lithography

Proceedings Volume 8679, 86790A (2013) https://doi.org/10.1117/12.2014139

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Light sources, Pulsed laser operation, Plasma, Magnetism, Chemical species, Laser systems engineering, Extreme ultraviolet lithography

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SPIE Journal Paper | 29 May 2012

Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography

Junichi Fujimoto, Hakaru Mizoguchi, Tamotsu Abe, Satoshi Tanaka, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hiroaki Nakarai

JM3, Vol. 11, Issue 02, 021111, (May 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021111

KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Carbon monoxide, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Magnetism, Ions, Laser applications

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Proceedings Article | 23 March 2012 Paper

Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography

Junichi Fujimoto, Tsukasa Hori, Tatsuya Yanagida, Takeshi Ohta, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Hakaru Mizoguchi

Proceedings Volume 8322, 83220F (2012) https://doi.org/10.1117/12.916093

KEYWORDS: Carbon dioxide lasers, Tin, Extreme ultraviolet, Light sources, Magnetism, Plasma, Extreme ultraviolet lithography, Chemical species, Ions, Pulsed laser operation

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Proceedings Article | 7 April 2011 Paper

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hitoshi Nagano, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Akihiko Kurosu, Krzysztof Nowak, Takashi Suganuma, Masato Moriya, Kouji Kakizaki, Akira Sumitani, Hidenobu Kameda, Hiroaki Nakarai, Junichi Fujimoto

Proceedings Volume 7969, 796908 (2011) https://doi.org/10.1117/12.880382

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Plasma systems, Extreme ultraviolet lithography, Light sources, Laser systems engineering, Mirrors, Magnetism

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Proceedings Article | 20 March 2010 Paper

First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, Akira Endo

Proceedings Volume 7636, 763608 (2010) https://doi.org/10.1117/12.846271

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Tin, Laser systems engineering, Plasma systems, Mirrors, Extreme ultraviolet lithography, Pulsed laser operation

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Proceedings Article | 16 March 2009 Paper

Optical performance of laser light source for ArF immersion double patterning lithography tool

Katsuhiko Wakana, Hiroaki Tsushima, Shinichi Matsumoto, Masaya Yoshino, Takahito Kumazaki, Hidenori Watanabe, Takeshi Ohta, Satoshi Tanaka, Toru Suzuki, Hiroaki Nakarai, Yasufumi Kawasuji, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743J (2009) https://doi.org/10.1117/12.813476

KEYWORDS: Lithography, Light sources, Double patterning technology, Laser optics, Line edge roughness, Spatial coherence, Speckle, Temporal coherence, Immersion lithography, Critical dimension metrology

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Proceedings Article | 16 March 2009 Paper

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Hiroaki Tsushima, Masaya Yoshino, Takeshi Ohta, Takahito Kumazaki, Hidenori Watanabe, Shinichi Matsumoto, Hiroaki Nakarai, Hiroshi Umeda, Yasufumi Kawasuji, Toru Suzuki, Satoshi Tanaka, Akihiko Kurosu, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7274, 72743L (2009) https://doi.org/10.1117/12.813642

KEYWORDS: Reliability, Oscillators, Light sources, Fluorine, Laser applications, Double patterning technology, Optical amplifiers, High power lasers, Excimer lasers, Immersion lithography

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Proceedings Article | 11 April 2008 Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, Satoshi Tanaka, Yukio Watanabe, Taku Yamazaki, Shinji Nagai, Osamu Wakabayashi, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

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Proceedings Article | 7 March 2008 Paper

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Toru Suzuki, Satoshi Tanaka, Ryoichi Nohdomi, Masaya Yoshino, Shinichi Matsumoto, Yasufumi Kawasuji, Hiroshi Umeda, Hitoshi Nagano, Kouji Kakizaki, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242R (2008) https://doi.org/10.1117/12.778149

KEYWORDS: Semiconducting wafers, Reliability, Immersion lithography, Light sources, Laser stabilization, Metrology, High power lasers, Spectroscopy, Laser development, Laser applications

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Proceedings Article | 27 March 2007 Paper

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Hidenori Watanabe, Shigeo Komae, Satoshi Tanaka, Ryoichi Nohdomi, Taku Yamazaki, Hiroaki Nakarai, Junichi Fujimoto, Takashi Matsunaga, Takashi Saito, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652031 (2007) https://doi.org/10.1117/12.711258

KEYWORDS: Molybdenum, High power lasers, Laser systems engineering, Laser applications, Light sources, Systems modeling, Semiconductors, Lithography, Electrodes, Pulsed laser operation

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Proceedings Article | 14 September 2001 Paper

Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography

Takashi Matsunaga, Tatsuo Enami, Kouji Kakizaki, Takashi Saito, Satoshi Tanaka, Hiroaki Nakarai, Toyoharu Inoue, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435703

KEYWORDS: Excimer lasers, Electrodes, Laser scanners, Lithography, 3D scanning, Chromium, Laser development, Pulsed laser operation, Light sources, Molecules

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Proceedings Article | 5 July 2000 Paper

High-NA high-throughput scanner compatible 2-kHz KrF excimer laser for DUV lithography

Hiroaki Nakarai, Naoto Hisanaga, Natsushi Suzuki, Takeshi Matsunaga, Takeshi Asayama, Jun Akita, Toru Igarashi, Tatsuya Ariga, Satoru Bushida, Tatsuo Enami, Ryoichi Nodomi, Yuichi Takabayashi, Syouich Sakanishi, Takashi Suzuki, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388987

KEYWORDS: Excimer lasers, Lithography, Electrodes, Cobalt, Laser scanners, 3D scanning, Control systems, Energy efficiency, Fluorine, Mirrors

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Proceedings Article | 26 July 1999 Paper

Performance of a highly stable 2-kHz operation KrF laser

Tatsuo Enami, Masaki Nakano, Takayuki Watanabe, Ayako Ohbo, Tsukasa Hori, Takashi Ito, Toshihiro Nishisaka, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi, Hiroaki Nakarai, Naoto Hisanaga, Takeshi Matsunaga, Hirokazu Tanaka, Tatsuya Ariga, Syouich Sakanishi, Takeshi Okamoto, Ryoichi Nodomi, Takashi Suzuki, Yuichi Takabayashi, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354313

KEYWORDS: Excimer lasers, Magnetism, Pulsed laser operation, Contamination, Semiconductors, Laser applications, Laser development, Fluctuations and noise, Fabry–Perot interferometers

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Proceedings Article | 29 June 1998 Paper

High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge

Tatsuo Enami, Osamu Wakabayashi, Toshihiro Nishisaka, Natsushi Suzuki, Takashi Nire, Hakaru Mizoguchi, Hiroaki Nakarai, Hirokazu Tanaka, Tatsuya Ariga, Kouji Shio, Takeshi Okamoto, Ryoichi Nodomi, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310733

KEYWORDS: Excimer lasers, Pulsed laser operation, Optical lithography, Halogens, Gas lasers, Lithography, Deep ultraviolet, Laser development, Solid state lasers, Reliability

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Proceedings Article | 7 June 1996 Paper

High-power KrF excimer laser with a solid state switch for microlithography

Hakaru Mizoguchi, Noritoshi Ito, Hiroaki Nakarai, Yukio Kobayashi, Yasuo Itakura, Hiroshi Komori, Osamu Wakabayashi, Taketo Aruga, Takashi Sakugawa, Takehisa Koganezawa

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240945

KEYWORDS: Excimer lasers, Solid state lasers, Pulsed power, Chlorine, Solid state physics, Switches, Pulsed laser operation, Optical lithography, Reliability, Switching

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Proceedings Article | 17 May 1994 Paper

Recent advances of a KrF excimer laser on a plant's practical requirements

Yukio Kobayashi, Takanobu Ishihara, Hiroaki Nakarai, Noritoshi Ito, Tomokazu Takahashi, Osamu Wakabayashi, Hakaru Mizoguchi, Yoshiho Amada, Junichi Fujimoto, Masahiko Kowaka, Yasuhiro Nozue

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175482

KEYWORDS: Excimer lasers, Pulsed laser operation, Performance modeling, Reliability, Lithographic illumination, Data modeling, Lithography, Laser development, Control systems, Inspection

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Proceedings Article | 8 August 1993 Paper

Stability of krypton fluoride laser in real stepper mode operation

Masahiko Kowaka, Yukio Kobayashi, Osamu Wakabayashi, Noritoshi Ito, Junichi Fujimoto, Takanobu Ishihara, Hiroaki Nakarai, Hakaru Mizoguchi, Yoshiho Amada, Yasuhiro Nozue

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150429

KEYWORDS: Pulsed laser operation, Excimer lasers, Optical lithography, Laser stabilization, Semiconducting wafers, Krypton, Lithography, Gas lasers, Fabry–Perot interferometers, Spectroscopy

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Showing 5 of 49 publications

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